过去的一段时间都没能好好的静下心来更新博客,这一拖更就是几个月的时间。其实期间我一直想更新博客来着,但被瓶颈给限制得很烦躁,幸运的是,最终我成功突破了这个瓶颈,并且在这段时间里提升了许多技能,这对我的未来工作非常有帮助。不知不觉中一年过去了,新的一年对我来说至关重要。
几个月前,我终于完成了一个一直计划中的事情,那就是将作品上传至Artstation。关注我的博客的朋友们可能知道,我很早之前就提过这个计划,但期间我一直受到一个困扰:我觉得我的渲染效果无法达到预期。起初,我一直使用URP对作品进行渲染,但结果并不理想。尽管如此,我还是勉强给一些作品做了渲染。
在这个过程中,这些问题促使我不得不想办法对自己的个人能力进行提高。为此我掌握了Unfold3D与Marmoset。是的,我选择了Unfold3D,而没有直接选择RizomUV,其中一个主要原因是因为我的显示器采用了124%的缩放比,这导致一些软件在我的电脑上无法正常使用。(鼠标位置与软件中识别的鼠标坐标不一致,这对于生产工具来说是致命的)目前,我发现了两个软件存在这个问题,一个是SAI,另一个是RizomUV。这个问题困扰了我很长时间,不得不浪费很多时间去解决和寻找解决方案。遗憾的是,目前网上所有可能解决这个问题的方法都不适用于我的电脑。因此,我最终还是回到了Unfold3D。不过就使用而言,实际上没有太大区别,毕竟主要工作流程还是单纯用于展UV。最开始我会想办法坚持看看是否能修复RizomUV的原因,是我认为可能新的版本在算法上可能会有所提升。当然这只是我个人的想法,并不一定是这样。
相比之下,学习Marmoset则顺利得多,尽管花了不少时间,但借着突破瓶颈后的那股劲,我很快掌握了它。与此同时,为了能使作品能拥有更好的效果表现,我选择重置了很多之前已经完成的模型。其中最有代表性的便是P320了。
重新处理这个模型也花费了不少时间。起初,我只是希望对模型进行简单的优化,但在实际修改过程中,我发现了许多之前没有处理好的细节问题。甚至有些部分的塑形位置完全没有处理好,这导致我在制作M18时不得不对模型进行大修。虽然说新的思路给我整体的修改起到了一定的帮助,但仍然不得不花费很多时间来处理一些看似无关紧要的工作。总的来说,结果是好的。毕竟,我从中获得了一些经验,尽管代价有些大。
之后,我投入到了作品发布的工作中。为了确保整体风格一致,并且希望我的代名标识能更具辨识度,我花了一些时间重新设计了之前使用的LOGO。当然,这个设计在我发布这篇博客时又进行了修改。 最初的设计主要围绕着我之前制作的作品内容,对我熟悉的朋友们应该知道我制作的作品很多时候主要都是围绕着军工或者警械方面,因此这版Logo我选择保留了最开始的MimikuWo Defense的主题,为了使其看起来更具战术风格,我选择了黑白纯色进行处理。这样做的好处是,当我将其作为作品的一部分,如法线贴图标识等时,能更好地处理到枪械模型等硬表面上。然而,随着新年的到来,我对未来的规划有了很大的改变。我希望我的作品不再局限于较小众的军事模型,因此我将LOGO修改为更通用、更具代表性的版本。同时,我也将LOGO中的战术防务元素修改为了Creative Workshop(寓意为MimikuWo的创意工坊),同时也将其中的子弹壳换成了咖啡杯,至于为什么是咖啡杯(因为我喜欢喝咖啡)。后续的很长时间,这个Logo都会伴随着我的新作品。
新的一年,我有着很多规划打算,为了这些规划,我不得不放弃很多之前在各种方面所作出的努力,也不得不离开一些之前所身处的圈子。我会将精力全部投入到一些地方,这里我没法展开说,毕竟涉及的东西太多了。简单一句话便是我需要想办法先能在一些领域生存下来。
昨天,我申请离开了LPD的开发团队以及Sgt团队,这只是改变的一个开始。另外新的一年中,军事类的作品也将会逐渐减少,我可能会转而去制作一些更大众化的模型,大家慢慢会看到。
EN:
Over the past period, I haven't been able to find the peace of mind to update my blog properly, and this hiatus has lasted for several months. Actually, during this time, I've been wanting to update my blog, but I've been frustrated by a bottleneck. Luckily, I finally managed to break through this bottleneck and have improved many skills during this period, which will be very helpful for my future work. Unknowingly, a year has passed, and the new year is crucial for me.
A few months ago, I finally completed something that had been planned for a long time, which was uploading my work to Artstation. Friends who follow my blog may know that I mentioned this plan a long time ago, but I was constantly troubled by one thing during that time: I felt that my rendering effects couldn't meet expectations. Initially, I had been using URP for rendering my works, but the results were not satisfactory. Despite this, I still managed to render some of the works.
During this process, these issues forced me to find ways to improve my personal abilities. To this end, I mastered Unfold3D and Marmoset. Yes, I chose Unfold3D instead of directly opting for RizomUV, primarily because my monitor uses a 124% scaling, which caused some software to not function properly on my computer. (Mouse position discrepancies with software-recognized mouse coordinates, which is fatal for production tools) Currently, I've found two software programs that have this issue, one being SAI, and the other being RizomUV. This problem troubled me for a long time, and I had to waste a lot of time trying to solve it and find solutions.
Unfortunately, all the possible methods found online to solve this problem don't apply to my computer. Therefore, I ultimately returned to Unfold3D. However, in terms of usage, there's actually not much difference, as the main workflow is still purely for UV unfolding. Initially, I would try to persist and see if the reason for RizomUV malfunction could be fixed, as I thought maybe the new version might have improvements in algorithms. Of course, this is just my personal opinion and may not necessarily be the case.
In contrast, learning Marmoset went much smoother, although it took some time, but with the momentum gained from breaking the bottleneck, I quickly mastered it. At the same time, in order to give the works a better presentation, I chose to reset many of the previously completed models. The most representative of these is the P320.
Reprocessing this model also took quite a bit of time. Initially, I just hoped to do some simple optimizations on the model, but during the actual modification process, I discovered many detail issues that hadn't been handled properly before. Even some parts of the shaping were completely mishandled, which led me to have to extensively revise the model when making the M18. Although the new approach helped with overall modification to some extent, I still had to spend a lot of time dealing with seemingly insignificant tasks.
Overall, the result is good. After all, I gained some experience from it, albeit at a considerable cost.
After that, I got into the work of publishing the works. In order to ensure a consistent overall style and hoping that my pseudonym logo would be more recognizable, I spent some time redesigning the logo I had used before. Of course, this design was modified again when I published this blog post.
The initial design mainly revolved around the content of the works I had previously produced. Friends familiar with me should know that many of the works I produce are often centered around military or police equipment, so for this version of the logo, I chose to retain the original theme of MimikuWo Defense and opted for a black and white monochrome treatment to give it a more tactical look. The advantage of doing this is that when I use it as part of the works, such as normal map logos, it can be better applied to hard surfaces such as firearm models.
However, with the arrival of the new year, I have made significant changes to my future plans. I hope that my works will no longer be limited to niche military models, so I have modified the logo to a more universal and representative version. At the same time, I also changed the tactical defense elements in the logo to Creative Workshop (symbolizing MimikuWo creative workshop), and replaced the bullet casings with coffee cups, as for why it's a coffee cup (because I like drinking coffee). For the foreseeable future, this logo will accompany my new works.
In the new year, I have many plans. To achieve these plans, I have to give up many efforts I made in various aspects before, and I also have to leave some circles I was previously in. I will devote all my energy to some areas, which I cannot elaborate on here, as there are too many things involved. In short, I need to find a way to survive in some fields first.
Yesterday, I applied to leave the LPD development team and the Sgt team, and this is just the beginning of the changes. Also, in the new year, military-themed works will gradually decrease, and I may turn to produce more mainstream models, which everyone will slowly see.